Patents
US Patent 7,187,430 |
Advanced Illumination System for Use in Microlithography |
US Patent 7,110,082 |
Optical System For Maskless Lithography |
US Patent 7,023,525 |
Imaging Apparatus |
US Patent 7,511,798 |
Off - Axis Catadioptric PO for Maskless Lithography |
European Patent EPA01202825 |
Imaging Apparatus - Maskless Lithography Tool |
US Patent 6,813,003 |
Advanced Illumination System for Use in Microlithography |
US Patent 7,317,583 |
High Numerical Aperture Projection Lens for Microlithography |
European Patent USP331785 |
High Numerical Aperture Projection Lens for Microlithography |
European Patent USP329758 |
Advanced Illumination System for Use in Microlithography |
US Patent 6,778,257 |
Imaging apparatus |
US Patent 6,775,069 |
Advanced Illumination System for Use in Microlithography |
Patent Pending 5019 |
Micrascan V Projection Optics Thermal Aberration Control systems |
US Patent 6,741,362 |
Method, System and Computer Program for Determining of Refractive Index Distribution |
Provisional Patent P-2479 |
Optical Magnifier With Large Field Of View |
US Patent 6,307,682 |
Zoom Illumination for Use in Photolithography |
European Patent US0003896 |
Zoom Illumination for Use in Photolithography |
US Patent 5,724,122 |
Illumination System Having Spatially Separate Vertical and Horizontal Image planes for Use in Photolithography |
European Patent US448994 |
Illumination System Having Spatially Separate Vertical and Horizontal Image planes for Use in Photolithography |
European Patent US449301 |
Hybrid Illumination System for Use in Photolithography |
US Patent 5,724,122 |
Illumination System Having Spatially Separate Vertical and Horizontal Image planes for Use in Photolithography |
USSR Patent 498587 |
Imaging Optical system |
USSR Patent 650460 |
Device for Coherent Light Concentration in a Small Volume |
USSR Patent 781738 |
Reproduction Optical System |
USSR Patent 708813 |
Focusing Lens |
USSR Patent 1224771 |
Reproduction Lens |
USSR Patent 1254550 |
Optical Device for Reproduction of Information |
US Patent 2005/0237505A1 |
Large Field Of View Unit Magnification Projection Optical System With Magnification And Aberration Correctability For Flat Panel Displays |
Patent Pending | Illumination Optical System for Maskless Lithographic Systems |
Patent Pending 5106 |
Multi-channel optical configuration for Maskless Lithographic Systems |
European Patent 02255177.4 |
Imaging Apparatus |
Patent Pending 5019 |
Micrascan V Projection Optics Thermal Aberration Control Systems |
Patent Pending 6040 |
Method, Systems and Computer Program Product for Determining Refractive Index Distribution |
Provisional Patent P-2479 |
Optical Magnifier With Large Field Of View |
US Patent 5,237.969 |
Ignition System Incorporating Ultraviolet Light |
USSR Patent 1446586 |
Objective With The Stop Behind |
USSR Patent 1280558 |
Objective With The Extended Entrance Pupil |
USSR Patent 1108378 |
Symmetrical Reproduction Objective |
USSR Patent 1056121 |
Objective |
Publications
"High Numerical Aperture 193nm Exposure Tool", Proceedings of the SPIE, Vol.4346, September 2001 |
"Advances in 193nm Lithography Tools", Proceedings of the SPIE, Volume 3878, August 1999 |
"Zoom systems: basic configurations," SPIE, Vol. 3129, September 1997 |
"Grapho-Analytical Method for the First Order Design of Two-Component Zoom Systems", Optical Engineering, May 1992 |
"Reproduction Pancratic System", Optical Engineering, Vol. 31, No. 5, May 1988 |
"Lens with One Moveable Component", Optical engineering, Vol. 29, No.2, February 1986 |
"Two Component Zoom Lens", Optical engineering, Vol. 28, No.4, April 1985 |
"Unique Aspects of Focusing Lenses Design", Journal of Optical Technology, No.7, July 1978 |
"Two Component Reproduction System", Journal of Optical Technology, No. 3, March 1978 |
"Imaging System", Cinematography, No. 8, August 1975 |
"High Numerical Aperture 193 nm Exposure Tool," Proc. SPIE, Vol. 4346, p. 606, September 2001 |
"Basic Theory of Four-Lens Optical System Design," Applied Optics, Vol. 35, No. 4, p.572, 1996 |
"Calculation of thin three-lens system," Soviet Journal of Optical Technology," No. 10, p. 24, 1988 |
"Calculation of thin three-lens cemented systems," Soviet Journal of Optical Technology, No. 3, p. 19, 1988 |
"Application of the theory of basic parameters to a calculation of optical systems," Soviet Journal of Optical Technology, No. 12, p. 25, 1984 |
"Use of Gaussian brackets for the first order calculation of optical systems," Soviet Journal of Optical Technology, No. 8, p. 18, 1983 |