Patents

US Patent
7,187,430
Advanced Illumination System for Use in Microlithography
 
US Patent
7,110,082
Optical System For Maskless Lithography
 
US Patent
7,023,525
Imaging Apparatus
 
US Patent
7,511,798
Off - Axis Catadioptric PO for Maskless Lithography
 
European Patent
EPA01202825
Imaging Apparatus - Maskless Lithography Tool
 
US Patent
6,813,003
Advanced Illumination System for Use in Microlithography
 
US Patent
7,317,583
High Numerical Aperture Projection Lens for Microlithography
 
European Patent
USP331785
High Numerical Aperture Projection Lens for Microlithography
 
European Patent
USP329758
Advanced Illumination System for Use in Microlithography
 
US Patent
6,778,257
Imaging apparatus
 
US Patent
6,775,069
Advanced Illumination System for Use in Microlithography
 
Patent Pending
5019
Micrascan V Projection Optics Thermal Aberration Control systems
 
US Patent
6,741,362
Method, System and Computer Program for Determining of Refractive Index Distribution
 
Provisional Patent
P-2479
Optical Magnifier With Large Field Of View
 
US Patent
6,307,682
Zoom Illumination for Use in Photolithography
 
European Patent
US0003896
Zoom Illumination for Use in Photolithography
 
US Patent
5,724,122
Illumination System Having Spatially Separate Vertical and Horizontal Image planes for Use in Photolithography
 
European Patent
US448994
Illumination System Having Spatially Separate Vertical and Horizontal Image planes for Use in Photolithography
 
European Patent
US449301
Hybrid Illumination System for Use in Photolithography
 
US Patent
5,724,122
Illumination System Having Spatially Separate Vertical and Horizontal Image planes for Use in Photolithography
 
USSR Patent
498587
Imaging Optical system
 
USSR Patent
650460
Device for Coherent Light Concentration in a Small Volume
 
USSR Patent
781738
Reproduction Optical System
 
USSR Patent
708813
Focusing Lens
 
USSR Patent
1224771
Reproduction Lens
 
USSR Patent
1254550
Optical Device for Reproduction of Information
 
US Patent
2005/0237505A1
Large Field Of View Unit Magnification Projection Optical System With Magnification And Aberration Correctability For Flat Panel Displays
 
Patent Pending Illumination Optical System for Maskless Lithographic Systems
 
Patent Pending
5106
Multi-channel optical configuration for Maskless Lithographic Systems
 
European Patent
02255177.4
Imaging Apparatus
 
Patent Pending
5019
Micrascan V Projection Optics Thermal Aberration Control Systems
 
Patent Pending
6040
Method, Systems and Computer Program Product for Determining Refractive Index Distribution
 
Provisional Patent
P-2479
Optical Magnifier With Large Field Of View
 
US Patent
5,237.969
Ignition System Incorporating Ultraviolet Light
 
USSR Patent
1446586
Objective With The Stop Behind
 
USSR Patent
1280558
Objective With The Extended Entrance Pupil
 
USSR Patent
1108378
Symmetrical Reproduction Objective
 
USSR Patent
1056121
Objective

Publications

"High Numerical Aperture 193nm Exposure Tool", Proceedings of the SPIE, Vol.4346, September 2001
 
"Advances in 193nm Lithography Tools", Proceedings of the SPIE, Volume 3878, August 1999
 
"Zoom systems: basic configurations," SPIE, Vol. 3129, September 1997
 
"Grapho-Analytical Method for the First Order Design of Two-Component Zoom Systems", Optical Engineering, May 1992
 
"Reproduction Pancratic System", Optical Engineering, Vol. 31, No. 5, May 1988
 
"Lens with One Moveable Component", Optical engineering, Vol. 29, No.2, February 1986
 
"Two Component Zoom Lens", Optical engineering, Vol. 28, No.4, April 1985
 
"Unique Aspects of Focusing Lenses Design", Journal of Optical Technology, No.7, July 1978
 
"Two Component Reproduction System", Journal of Optical Technology, No. 3, March 1978
 
"Imaging System", Cinematography, No. 8, August 1975
 
"High Numerical Aperture 193 nm Exposure Tool," Proc. SPIE, Vol. 4346, p. 606, September 2001
 
"Basic Theory of Four-Lens Optical System Design," Applied Optics, Vol. 35, No. 4, p.572, 1996
 
"Calculation of thin three-lens system," Soviet Journal of Optical Technology," No. 10, p. 24, 1988
 
"Calculation of thin three-lens cemented systems," Soviet Journal of Optical Technology, No. 3, p. 19, 1988
 
"Application of the theory of basic parameters to a calculation of optical systems," Soviet Journal of Optical Technology, No. 12, p. 25, 1984
 
"Use of Gaussian brackets for the first order calculation of optical systems," Soviet Journal of Optical Technology, No. 8, p. 18, 1983