Mr. Oskotsky has more than thirty years progressive experience in Optical Design, Optical Engineering, Optical Manufacturing and Metrology, research and development, management and training. He holds more than 30 patents and published numerous papers in a field of Optical Engineering. Most of his developments have been patented. Also, Mr. Oskotsky has developed designs, breadboards, prototypes and production of the optics for Optical Lithography Projection Optics and Illumination Systems, wafer inspection lenses and others.

As Optical Design Department Director at SVGL-ASML, Mr. Oskotsky was responsible for managing Optical Design and Optical Analysis activities, metrology and production support of all ASML-SVGL Micrascan tools. He generated project proposals to assist in overall SVGL-ASML management in planning, scheduling and budget control.

Mr. Oskotsky was Principal Optical Designer of MSII, MSIII, MS193, MSV and MSVII Illumination Systems, Principal Optical Designer of ASML AT1400 and AT1600 lithography systems; he managed concept development and optical design and analysis of Maskless Lithographic Tool. He was responsible for metrology and alignment systems optical design, analysis and production support.

In FLIR Systems, Inc. Mr. Oskotsky was responsible for the Optical design and Optical Analysis activities, production and development support. He was a leading Optical designer of FLIR IR optical systems for military applications. Mr. Oskotsky successfully completed optical design and fabrication support on an accelerated schedule of a Compact FLIR for Israel Aircraft Industries Ltd. and he was Principal Optical Designer of FLIR for McDonnell Douglas Electronic Systems Co.

Mr. Oskotsky holds more than 30 patents and has numerous technical publications on Optical Design & Optical Engineering.

Mr. Sakin has more than thirty years progressive experience in Optical Design, Optical Engineering, Optical Manufacturing and Metrology, research and development, management and training. He holds more than 10 patents and published numerous papers in a field of Optical Engineering.

As Chief Technical Officer at Optical Design Associates he is responsible for successful development and implementation of all projects including low and high end lithography machines, near and far infrared devices, ophthalmological systems, telescopical systems, and others. These responsibilities included technical development and oversee of all production and metrology stages.

As Senior Project Leader at ASML, Mr. Sakin was leading a team of optical designers in both imaging and illumination optics, providing state-of-the-art optical system development. He had full responsibility for all aspects of optical design at ASML and was heavily involved in the Maskless Tool Project and Flat Panel Display Project.

Prior to entering management, he was a leading optical designer of optical systems for all generations of Micrascan lithography machines and the X-ray lithography machine. In this role, his responsibilities have included: system engineering, (i.e., transforming the scenario into an appropriate set of optical system specifications), conceptual and detailed optical design, in-depth computer modeling of the optical system to support performance prediction, error budget derivation, flowdown and piece part tolerance allocation, assembly/test procedure development and implementation, acceptance test plan development, acting as interface between design engineers and assembly technicians, and development and presentation of all optical information to the customer from proposal through final design review.